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C 2
CONTAMINATION CONTROL MAGAZINE | UITGAVE VAN VCCN | JAARGANG 31 | EDITIE 3-2018
MGZN
ISCC’18
INTERNATIONAL SYMPOSIUM ON CONTAMINATION CONTROL
special edition
THE NETHERLANDS, THE HAGUE 23 - 26 SEPTEMBER 2018
WE SHARE THE KNOWLEDGE
Vereniging Contamination
Control Nederland
CLEANROOM LAUNDRY SERVICES
We take care of your contamination control so
® you can focus on your core business
SCIENTIFIC CREDIBILITY Security of quality – due to continuous monitoring and
enhancement of our cleanroom plants, you are always
ensured high quality products and level of service
Innovation - bringing you modern and effective solutions
utilising traceability solutions, plus maximising
contamination control in your cleanrooms.
Oslo
Service reliability – business contingency Nyköping
plans secured between our 28 plants Moscow
ensure effective delivery, whatever the Holbæk
circumstances.
São Paolo Kaluga
Bolsward
Birr
Quality has
Newbury Poznan
Berlin
Cork
Slavkov
Anderlecht
Bad Windsheim
Pont-l’Evêque
Saverne
its color
Corbeil Bienne
Miskolc
Vienne Milano
Toulouse
Grenoble
Oslo
Nyköping
Rousset
Moscow
Holbæk
São Paolo Kaluga
Bolsward
Birr
Newbury Poznan
Berlin
Parets
Cork
Slavkov
Anderlecht
Bad Windsheim
Torres
Pont-l’Evêque
Saverne
Corbeil Bienne
Miskolc
Vienne Milano
de la Alameda
Toulouse
Grenoble
Rousset
Parets
Torres
de la Alameda
Always innovating as we want to ensure you the highest quality products and services:
Connected Garments Cleaning Autoclave
Cleanroom Goggles Systems Services +more
Footwear
Ask about the
23-25 September GOWNING PROCEDURE
Visit us at ISCC DEMONSTRATION
is a brand of STAXS ® Discover the DOTCH® cleanroom disposables Booth A&B at our booth
www.staxs.eu
CONTENT
P R E F A C E
ISCC'18
OPENING ISCC’18 SYMPOSIUM IN LESS THAN FOUR WEEKS! PREFACE
While Dutch summer keeps its hot and sunny days coming, temperatures
04 Preface by Eric Stuiver
continue to rise in the VCCN ISCC’18 organizing team.
SELECTING CLEANROOM STANDARDS
This special ISCC’18 magazine provides all the information you need 06 How to select the standards you need?
before hundreds of contamination control experts gather on September
23rd – 26rd for the ISCC’18 symposium at the World Forum in The Hague. NANOTECHNOLOGY
Knowledge development and knowledge sharing are the cornerstones
10 Keynote speaker Dave Blank
of our associations. With this in mind the scientific committee has put
together a programme that matches the interest of both senior and MICROBIOLOGY
junior contamination control professionals. Have a close look at our 12 Keynote speaker Bas Zaat
symposium programme that includes more than 80 speaker sessions,
KEYNOTE SPEAKERS
workshops and tutorials. Good preparation ensures that you make the EXTREME ULTRAVIOLET LITHOGRAPHY
During the congress, four prominent keynote speakers will fill you
most of your participation.
in on the latest developments in their field. Hear everything about 14 Keynote speaker Vadim Banine
nanotechnology by Dave Blank, micro biology by Bas Zaat, extreme DEMONSTRATORSmer
The start of the programme on September 24 will be a special
th
ultraviolet lithography by Vadim Banine and learn all about the During ISCC'18 you can attend interesting presentations. A PREVIEW OF THE FUTURE
ceremony that takes you into “The world behind contamination control”.
So be sure you are on time in the World Forum in The Hague.
developments and expectations for the near future by Peter Ros. Meet the people and companies involved in printed
flexible electronics on paper, photonic integrated circuits, 16 Keynote speaker Peter Ros
nanoparticles at the push of a button, in air microfluidics,
A wide range of international companies looks forward to showing you
10
lab on a chip, and sunsensors for space and terrestrial PROGRAMME SUNDAY-WEDNESDAY
their latest innovations at their stands. Furthermore our next generation
applications. 20 Timetable for all days
26
of contamination control experts will be represented at the symposium
by the Technasium; a Dutch network of high schools dedicated to
encouraging students to choose science and technology oriented SPOTLIGHT ON MONDAY
education. 22 Timetable and programme for Monday 24th September
I look forward seeing you at the ISCC’18.
SPOTLIGHT ON TUESDAY & WEDNESDAY
24 Timetable and programme for Tuesday 25th September
and Wednesday 26th september
EXHIBITORS
27 Alphabetic overview of the exhibitors
DEMONSTRATORS
28 Overview of demonstrators
HOW TO SELECT THE CLEANROOM STANDARDS WORKSHOPS & TUTORIALS WORKSHOPS & TUTORIALS
YOU NEED ICCCS-ISO Improve your skills and knowledge during the many practical 30 Programme for workshops and tutorials on Monday
This year at the ICCCS symposium ISCC 2018 there workshops and tutorials. There is a wide offer in the field and Tuesday
will be several occasions, during presentations, tutorials, of designing cleanrooms, cleaning (including procedure TECHNASIUM
workshops and meetings to discuss the need and use of development ) and cleanroom behavior. In addition, you can
learn about the impact of nanoelectronics, the monitoring of
32 Students will be linked to your company's case
the ISO 14644 and 14698 cleanroom standards. to look at it from a fresh angle
particle deposition and various new guidelines.
Eric Stuiver CLEAN RUMOURS
Chairman VCCN
Ir. Koos Agricola
33 Dusty & Bacter are concerned
06 28 33
COLOPHON
Editors and contact
Contamination Control Magazine volume 3-2018 5
“
SELECTINGSTANDARDS
Every two years the ICCCS symposium provides a good opportunity for the
interaction between the experts that write new cleanroom standards and the
people that use these standards. The cooperation between the ICCCS and the
ISO 209 is such that meetings are aligned and hot topics are discussed within
the ICCCS symposia. This year at the ICCCS symposium ISCC 2018 there will
be several occasions, during presentations, tutorials, workshops and meetings
How to select to discuss the need and use of the ISO 14644 and 14698 cleanroom standards.
the cleanroom
A risk
Cleanroom standards the best way to select the standards of interest. The
standards Initially cleanroom standards focussed on establishing risk based approach was already introduced in the
and operating cleanrooms with a specific cleanroom standards on biocontamination and recently in the
you need. class. Slowly a cleanroom has become a required standards on monitoring air cleanliness with respect
based
facility, necessary to carry out contamination control. to particles.
ICCCS – ISO The applications of cleanroom technology expanded
and other contaminants apart from particles are Risk assessment
Cleanroom standards addressed. These other contaminants are chemical A risk assessment is applied to determine the
and nanosized particles. The viable particles or type of unwanted contaminants. For the setting
cooperation.
approach
micro-organisms are addressed in separate sets of requirements it is worthwhile to determine the
of standards, using risk assessment as the leading acceptable and unacceptable level of contamination.
theme. Cleanrooms are used to keep vulnerable In a product, surface cleanliness is important.
surfaces clean. So new standards on surface Looking at the functions of the product the critical
is the best
cleanliness and ways to achieve a particular surface surface(s) within the product can be determined.
Ir. Koos Agricola cleanliness level, had to be made. By investigating the concentration, size and/or
NEN/VCCN delegate ISO TC 209 To create a clean, controlled environment it is type of contamination the maximum acceptable
and CEN TC243 important to determine the source strength of concentration can be determined.
people, garments, consumables and equipment. From this the final surface cleanliness can be
way
Therefore a standard measurement method and a determined. When the critical surface is exposed
normative way of expressing and applying emission it can be contaminated by deposition and contact
data were described. transfer. The amount of acceptable deposition and
By finetuning the amount of clean air and the people, contact transfer is determined by the difference
to select
equipment and materials in the cleanroom the over between the final surface cleanliness and the initial
specification of air volume can be prevented. This surface cleanliness.
effort will help to reduce the required energy. In a The acceptable amount of deposition, the time of
new standard, various ways of reducing energy use exposure and the critical surface area determine the
are described. contaminant deposition rate. From this information
the
Since the focus has been on air cleanliness that can the required air cleanliness level can be derived.
by measured by light scattering particle counters, The acceptable contact transfer, number of contacts
“
standards
of interest
the impact of particles that cannot be removed
effectively by air flow was almost neglected. The
particles that cannot be removed deposit on surfaces.
In applications such as optics, space industry
and displays, the deposition of macro-particles is
very important. Macro-particles are also the main
microbe carrying particles (mcp’s) and therefore the
deposition rate of mcp’s is important in applications
such as medical devices and hospitals. Measurement
methods for the determination of the particle
deposition rate have been known for decades, but
these are labour intensive. New instrumentation
makes the measurement more accessible and so
there is a need for a standard on particle deposition
and contact area within the critical surface area
determine the maximum contaminant surface
concentration of the contact surface. From this
information the required surface cleanliness levels
can be derived.
In some applications the product approach cannot be
used, instead cleanliness levels of the environment
(air and surrounding surfaces) are determined. This is
often applied in biocontamination, but when looking
at hospitals, the critical wound area of a patient can
be treated in a similar way to a product.
Setting requirements
From the risk assessment the contaminants and the
rate application. acceptable and unacceptable contamination levels
Due to the increase of all these cleanroom standards at critical location are derived. Sometimes additional
(see overview at the end of this article) a different details of the unwanted contaminants are important.
approach has to be developed as to how to use This could be the electrical conductivity of particles
these standards. Since cleanrooms are used to limit or a specific type of micro-organism. In those cases
and control unwanted contamination of products, a fraction or all particles or micro-organisms are
processes and patients, a risk based approach is considered to be unwanted.
6 Contamination Control Magazine volume 3-2018 7
SELECTING
So for establishing control the standard on design, 2 are used.So for the realisation of the contamination
construction and start up should be combined control solution of the assembly of this medical
with the standards that provide information on the device, 10 standards (ISO 14644-1, 2, 3, 4, 5, 7,
STANDARDS determination of source strength. The standard on
the operations can be used to design the operational
procedures. Operational procedures will impact the
14, 17 and 18 and ISO 14698 or EN 17141) of the
18 available standards are used.
particle deposition rate level. Overview ISO-CEN cleanroom standards
-continuation-
After the design, the facility is constructed and equipment ISO 14644 Cleanrooms and associated controlled
and procedures are implemented the effectiveness of environments
Use of cleanroom standards
Risk Assessment
the established control should be verified.
Critical contaminants Particles number, size
1. Part 1 Classification of air cleanliness by particle
Viables number, type Demonstrating control concentration.
Nanoscal particles number, size When the contamination control solution is ready to 2. Part 2 Monitoring to provide evidence of
Chemicals mass, type operate, the cleanliness attributes of interest should cleanroom performance related to air
Critical surfaces cleanliness by particle concentration.
be monitored to demonstrate control. When sufficient
Critical environment 3. Part 3 Measurement method.
Setting requirments and measurment methods
data are available the combination of the air handling 4. Part 4 Design, construction and start up.
Contaminans Surface Air and operation can be optimised. This is useful to 5. Part 5 Operations.
Particles 14644-9 14644-1,3 prevent the use of more energy than necessary. 6. Part 6 Definitions (withdrawn).
Viables 14698-1 14698-1 Use of cleanroom standards 7. Part 7 Separate devices.
Nanoscal particles NA 14644-12
So keeping in mind the steps described above the 8. Part 8 Classification of air cleanliness with
Chemicals 14644-10 14644-9
Establish control
right standards can be selected per step. This is respect to chemicals.
Design cleanroom 14644-4,7,16 given in the overview in table 1. 9. Part 9 Classification of surface cleanliness by
sources 14644-14,15,18 particle concentration.
procedures 14644-5,13,17 Take for example the assembly of a medical device 10. Part 10 Classification of surface cleanliness by
Construction 14644-4,7
that is packed after sterilisation. During assembly chemical concentration.
Verification 14644-3,4 + cleanliness attributes 11. Part 11 none.
particles larger than 10 µm can give interconnection
Demonstrate control 12. Part 12 Specifications for monitoring air
Operation 14644-5,13,17 14644-14,15,16,18
problems. After assembly the device is closed cleanliness by nanoscale particle
Contaminans Surface Air and there is no interaction with the outer surface. concentration.
Particles 14644-9 14644-1,3 The device has to be implanted into a patient and 13. Part 13 Cleaning of surfaces to achieve defined
Viables 14698-1 14698-1 therefore it should be free of micro-organisms. levels of cleanliness in terms of particle
Nanoscal particles NA 14644-12
The incoming parts should fulfil specified cleanliness and chemical classifications.
Chemicals 14644-10 14644-9
levels (part 9). During assembly particles can 14. Part 14 Assessment of suitability for use of
Table 1. Overview of standards to be used when deposit from air, therefore a cleanroom with clean equipment by airborne particle
setting up and operating a contamination solution air is required (part 1 and part 17). After assembly concentrations.
the device is sterilised and packed. The surfaces 15. Part 15 Assessment of suitability for use of
For the determination of cleanliness levels, the of the device and packaging should be free of equipment and materials by airborne
chemical concentrations.
measurement method that will be used is also micro-organisms (14698-1). Deposition of micro-
16. Part 16 Code of practice for improving energy
important, since different measurement methods can organisms should be prevented by providing a clean efficiency in cleanrooms and clean air
give different cleanliness levels. environment (14698-1 and part 1 and 17). devices.
So cleanliness requirements should be set at critical 17. Part 17 Particle deposition rate applications.
locations. The required standards depend on the type of For the design a cleanroom and two separative 18. Part 18 Assessment of cleanroom
contaminants. Cleanliness levels for the contaminants of devices are foreseen (part 4 and 7). Two persons are suitability of consumables.
interest can be set for both air and surfaces. going to work in the cleanroom. Estimated emission
data for 0.5 µm and 5 µm particles and cfu’s (colony
Establishing control forming units) are taken from literature. The particle ISO 14698 Cleanrooms and associated
To be able to perform contamination control, a emission data are given by the supplier using part controlled environments; bio-contamination:
clean facility plus a set of appropriate operational 14 and/or part 18. Operational procedures for entry a. Part 1 Bio-contamination control:
procedures are required. People often tend to focus and exit and cleaning are designed using part 5. Part general principles and methods.
on the cleanroom, but to make the design fit for use 16 is used to design an energy efficient air handling b. Part 2 Evaluation and interpretation
the operational procedures will have impact on the system. of biocontamination data.
design of the lay out and the air handling system. c. CEN revision EN 17141 Bio-contamination.
By the use of separative devices, the cleanroom can For the verification part 1, 3, 9 and 14698 are used.
be made more effective and more energy efficient. For demonstrating control part 2, 9, 17 and 14698- Standards in Italics are still in preparationt
8 Contamination Control Magazine volume 3-20188 9
“
NANOTECHNOLOGY
Dave H.A. Blank is the opening keynote speaker at ISCC’18 on Monday 24
September. He started his studies at the primary technical school (LTS), followed
by the secondary technical school (MTS) and higher technical school (HTS). In
1991, after his masters in Applied Physics, he received his PhD in Physics from
the University of Twente, Netherlands for his dissertation on High-Tc thin films
prepared by laser ablation: an experimental study, under supervision of prof. dr.
Prof. dr. ing. Dave Blank is
Keynote speaker Horst Rogalla.
a scientific ambassador
Dave Blank:
In 1992 he became assistant professor in Rogalla’s of atomic arrangements through building structures
and university professor group. After a research fellowship at Stanford in the in a bottom-up fashion and having direct one-to-one,
group of prof. Malcolm Beasley and prof. Theodore atomic-scale control of the constituting layers.
at the University of Twente. Geballe in 1998, he was appointed as associate Many of his latest discoveries and contributions
professor and programme director on the materials have enabled the synthesis of materials, allowing
He is professor of nano science of interfaces in the MESA+ Institute for for practical applications in the fabrication of artificial
Discover
Nanotechnology at the University of Twente. high-temperature superconductors and ferroelectric
materials and member of Since October 2002 he is full professor in Inorganic superlattices.
Materials Science at the same university. At this present time, many of the structures are
various advisory boards. being used in the fabrication of two-dimensional
On January 1, 2007 he became the Scientific electron gasses in the field of interface engineering
He has (co) authored more
the mega
Director of MESA+ Institute for Nanotechnology, of complex oxide heterostructures.
than 300 scientific University of Twente. MESA+ hosts over 550
scientists with an annual budget of over 50 MEuro. Future oxide device developments
publications and gives a Nowadays, the field of study is considered as a key
impact
Chief Scientic Ambassador research area for future oxide device developments.
multitude of lectures in the From September 2016 he is Chief Scientific These scientific achievements were honoured as one
Ambassador and Distinguished Professor at the of the most remarkable scientific breakthroughs of
field of nanotechnology. University of Twente. The Inorganic Materials 2007 (Science 318 (2007) 1844) of the interface
Science research group focuses on growth studies, engineering in complex oxide heterostructures, which
with
deposition and structuring techniques, and properties showed the ability to make novel combinations of
of complex materials, especially oxides. The group oxides that can outperform semiconductor structures.
developed strategies to build inorganic materials, Contributions in this field are reported in, e.g., Nature
in an atomic layer-by-layer fashion, by true atomic- Mat. 5 (2006) 556, Nature Mat. 6 (2007) 493,
miniscule
deposition control thereby exhibiting novel and Nature Mat. 7 (2008) 270, Adv. Mat. 21 (2009)
nano
“
technology
unprecedented properties. His research is based
in large part on inventing designer-inorganic (tailor-
made) nanomaterials that are prepared by atomic
precision. He has (co)authored over 300 papers
in refereed journals, holds an h-index of 48, and
supervised 34 PhD candidates.
Together with prof. Guus Rijnders, the first time-
resolved high pressure RHEED-system was
developed, operating in-situ during pulsed laser
deposition at high pressures up to 100 Pa. With
this system several new growth phenomena have
been observed, leading to new growth techniques
of complex materials, like pulsed laser interval
1665.
Besides all this, Blank is member of the Royal
Society of Arts and Sciences, Gothenburg. He is
member (Captain of Science) of TopTeam “High Tech
Systems and Materials” appointed by the Minister of
Economic Affairs of the Netherlands. He is member of
AcTI, Dutch Academy of Technology and Innovation
and he is a member Advisory Council for Science,
Technology and Innovation Policy (AWTI) that advises
the Dutch government and parliament on policy
in the areas of scientific research, technological
development and innovation. From 2010 he is
chairman of NanoNextNl.
deposition. Furthermore, the systems can be used
to study and realize block-by-block deposition of He has given over 100 invited and plenary
(artificial) complex materials. The latter has helped to presentations, including presentations for broader
create an entire new branch of science in inorganic audiences, like Lowlands and Zwarte Cross open-air
materials which rests on the exact and precise control pop festivals. t
10 Contamination Control Magazine volume 3-2018 11
“
MICROBIOLOGY
Dr. Sebastian A.J. Zaat is the second keynote speaker at ISCC’18. His area
of expertise is Health Care. He is Principal Investigator of the research line
“Biomaterial-associated infection and novel antimicrobial strategies” of the
Amsterdam Academic medical Center, The Netherlands. His research is focused
on pathogenesis, prevention and treatment of biomaterial-associated infections,
both in soft tissue (catheters, surgical meshes) and bone (implants, fixation
Bas Zaat is one of the
Amsterdam Academic
Keynote speaker devices).
Bas Zaat:
Based on a thorough understanding of the events antimicrobial components of one medicinal honey
Medical Center's leading to infection, novel strategies are being and are investigating the components responsible
developed including rapid microbial diagnosis, anti- for the antimicrobial activity of a large collection
principal investigators. infective coatings not subject to bacterial resistance of monofloral honeys in order to identify novel
development, prevention of biofilm formation, and antimicrobials, in order to provide additional solutions
Focus of his research: enhancement of killing of bacteria hiding in tissue for the major problem of antibiotic resistance. t
surrounding inserted or implanted medical devices.
How to cure
biomaterial-associated These approaches are aimed at maximally reducing
the risk of infection for patients who depend on such
infections and novel medical devices.
antimicrobial stategies.
bacterial
Biomaterial-associated infections
Biomaterial-associated Infections of biomedical devices, or “biomaterials”
(catheters, prosthetic heart valves, implants), are a
infections, i.e. infections major and increasing problem in modern medicine,
infections
especially in view of the increase in antibiotic
of biomedical devices, or resistance. The research has discovered that bacteria
do not only colonize the medical device by biofilm-
“biomaterials” (catheters, formation, but also persist in surrounding tissue, due
to disturbed local immunity. Bacterial, biomaterial,
that
prosthetic heart valves, and host-responses involved in the pathogenesis are
subject of studies, in order to find novel approaches
implants), are a major and for treatment and prevention. In the NANTICO
increasing problem in mo- (Non-adherent ANTImicrobial Coatings) consortium
can't be
project different antimicrobial coating strategies
dern medicine, especially have been developed to prevent infection. In the
IBIZA (Imaging of Biomaterial-associated Infection
in view of the increase in using Zebrafish Analysis) a novel model for testing
controlled
new biomaterials is being developed, and in the
antibiotic resistance.
with
“
antibiotics?
BALI (Biofilm Alliance) EU FP7 project we develop
novel Synthetic Antimicrobial Antibiofilm Peptides for
controlled release coatings to prevent infection of
titanium implants.
Novel antimicrobial strategies
The increase in antibiotic resistance necessitates
investigations into novel antimicrobial strategies.
For this we study cationic antimicrobial proteins and
peptides (AMP) and natural sources such as medical
grade honey. We have identified thrombocidins
as the major AMP of human blood platelets, and
have designed novel SAAPs (see above) based on
their structure. The mechanism of action of these
SAAPs is studied in depth, and they are utilized for
a variety of translational research projects. Honey
has been used as an antimicrobial agent since
ancient times. We have fully characterized the
12 Contamination Control Magazine volume 3-2018 13
“
EUVLITHOGRAPHY
Vadim Banine is Director Defectivity Department at ASML. At ASML Vadim Banine
has been working on the EUVL (Extreme Ultraviolet Lithography) since 1966.
The physicist did a two year research at the Eindhoven University of Technology,
where he also got his PhD. Vadim Banine is a part time professor at the Eindhoven
University of Technology. Banine's research interests include EUV lithography,
plasma physics, surface physics and chemistry as well as accelerator technology.
Using high energy lasers, EUV lithography is a promising technology for making electronic chips smaller
EUVL etches details and more powerful - a promise that ASML, in collaboration with universities such
Keynote speaker as TU/e, Twente University and the Russian ISAN, means to turn into a reality.
on nanoscale
onto silicon wafers Vadim Banine: At ASML, Banine is responsible for general
research program definition and roadmapping,
managing and coaching research project leaders,
reticle backside impact the substrate flatness
and thus the printing quality of structures that
need to be printed onto the wafer impacting
for the production external laboratories and projects worldwide and device performance, or worse case resulting in
the development of the EUV research process, its a nonfunctional device.
of microchips. knowledge base, working group capacity and external • Availability: removal of contamination
The next generation of
Smaller
network. His strong career in industry makes Banine (cleaning) is typically a time consuming
an expert on the organization and development of activity that results in system down time.
microchips should enable research programs and groups, project leadership,
combining enterprise and science and bringing Throughput through Optics lifetime: at certain
innovations in health, results to development. Banine is a member of the contamination levels transmission of the system
and more
Scientific Advisory Committee (SAC) at FOM. He has reduces, which decreases amount wafers, which can
electronics, entertainment, more than 60 patents, is the winner of the ASML be produced in the unit of time.
patent award and has over 40 publications to his
self-driving cars, robotics name. New Technology
For ASML, cleanliness means that the amount of In the current presentation the path of EUV lithography
and artificial intelligence.
powerful
particles (defects) or molecular contamination on from an historic perspective as well as the view on
a contamination critical surface does not impact it in the future will be shown. Particular changes in
system performance beyond its specification for recently new technology with respect to cleanliness
the complete lifetime of the system, both for the specifications, analyses, design, tooling, skills etc. will
microchips
lithographic system itself as well as the substrates of be described. t
ASML’s customers.
New Vision
In recent years, with the introduction of Extreme
are the key
Ultraviolet Lithographic (EUVL) systems, cleanliness
“
to new
applications
requirements have become even more tight and
it can be said that they acquired a new meaning.
A significant paradigm shift occurred, while the
engineers building lithographic systems operating
under normal pressure, with refractive optics and
deep UV laser radiation had to adapt operation in
vacuum, with multi-layer reflective optics and under
EUV radiation. It introduced a new vision with respect
to cleanliness and defectivity.
Both molecular and particle contamination are being
considered for EUVL.
The system performance parameters impacted by
contaminants are:
• Yield loss: particles on wafer front side and
particles on reticle (mask) damage the structure
that needs to be printed on the wafer resulting
in a non-functional device.
• Overlay and focus: particles on wafer and
14 Contamination Control Magazine volume 3-2018 15
“
FUTUROLOGIST
Digitization and the exponential growth of technology stresses the urge for a
flexible and agile mindset, because disruptive changes arrive at ever increasing
speed! What meta-trends will be relevant and what kind of 'modus operandi’
do we need to develop ourselves as a human being, organization and society?
Future strategist Peter Ros explores several of these technological trends and
will give some suggestions for a useful attitude towards the upcoming changes
Peter Ros is entrepreneur, Keynote speaker that will confront us.
Peter Ros:
strategist, 'boardroom Peter Ros has very specific ideas about technological
sparring partner' and developments and their impact on society. He mainly
focuses on how society is able to benefit and make
international keynote optimal use of all the current emerging and disruptive
technologies.
speaker. He has strong
ideas about technological I try to From nano- and neurotechnology to photonics,
robotics and artificial intelligence. As co-founder of
the Permanent Beta Platform he was one of the
make
developments and trends first to outline the significance of increasing (inter)
connectivity and the importance of swarm people
and their impact on people, who are willing to share information and knowledge.
the room
companies and society as
Moreover, Peter Ros knows human behaviour and
a whole. emphasises the societal impact and the way in which
employers, employees and organizations can best
think and
respond to them. His fascination for the combination
of technology and human insight makes his story a
powerful message.
to go Peter Ros sees kick-starting the Permanent Beta
initiative as his most important project of the past five
years. This platform is a hub for representatives of
home with
the digital forefront, social innovators, scientists and
artists. Here, experts share knowledge, explore new
horizons and create spaces in which they experiment
with how society can make optimal use of technology
energy and and connectivity. t
“
perspective
for
the future
16 Contamination Control Magazine volume 3-2018 17
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•Installation friendly enclosure •Flow measurement
•Operation and patient room
monitoring.
www.peda
k.nl | +
31 (0
Visit CaTeC at the ISCC exhibition!
)475
www.cleanroomcg.com 497
info@catec.nl - www.catec.nl
424
18PROGRAMME
TIME SUNDAY MONDAY TIME TUESDAY WEDNESDAY
23 SEPT 24 SEPT 25 SEPT 26 SEPT
08:00 - 08:30 REGISTRATION 08:00 - 08:30 REGISTRATION
08:30 - 09:15 OFFICIAL OPENING ISCC’18 08:30 - 09:15 KEYNOTE SPEAKER
09:15 - 10:00 KEYNOTE SPEAKER 09:15 - 10:30 S17 S18 S19 S20 W4
SOCIAL CULTURAL PROGRAMME
FOR SYMPOSIUM PARTICIPANTS
10:00 - 10:30 BREAK
AND ISCC REPRESENTATIVES
AT THE EXHIBITION
10:30 - 11:45 S1 S2 S3 S4 T1 10:30 - 11:00 BREAK T3 TECHNICAL
AT THE EXHIBITION VISIT
11:45 - 13:00 S5 S6 S7 S8 W1 11:00 - 12:15 S21 S22 S23 S24 W5 W6
LUNCH LUNCH LUNCH
13:00 - 14:00 AT THE EXHIBITION 12:15 - 13:15 AT THE EXHIBITION
14:00 - 15:15 S9 S10 S11 S12 W2 13:15 - 14:30 S25 S26 S27 W7 W8
15:15 - 15:45 BREAK T2 14:30 - 15:00 BREAK T4 TECHNICAL
AT THE EXHIBITION AT THE EXHIBITION VISIT
15:45 - 17:00 S13 S14 S15 S16 W3 15:00 - 15:45 KEYNOTE SPEAKER
REGISTRATION
17:00 - 17:45 KEYNOTE SPEAKER 15:45 - 16:45 CLOSING CEREMONY ISCC’18
WELCOME PARTY
17:00 - 20:00
DRINKS
17:45 - 18:15 AT THE EXHIBITION
18:00 - 19:00 CLOSING
CLOSING
DINNER
ATDINER
MUSEUM
BANQUET
19:00 AT THE LOUWMAN
BANQUET MUSEUM
DINNER S= SPEAKER SESSION W=WORKSHOP T=TUTORIAL
BEELDEN AAN ZEE
14
20 Contamination Control Magazine volume 3-2018 21MONDAY 24 SEPT
TIME PROGRAMME MONDAY 24 SEPTEMBER TIME PROGRAMME MONDAY 24 SEPTEMBER TIME PROGRAMME MONDAY 24 SEPTEMBER WORKSHOPS MONDAY 24 SEPTEMBER
11:45 Risk analyses in life science 14:00 ICCCS STANDARDS
08:00 REGISTRATION Monday 24 September
• Why establishing contriol proves to be difficult 11:45 – 12:45 Cleaning
André van Tongeren IMI Aero Dynamiek • ISO TC209 new cleanroom standards and
08:30 outreach projects I Berthold Duthorn - Bosch 14:00 – 15:00 Impact of nano electronics
OFFICIAL OPENING ISCC’18 • Proposed changes to EU GMP Annex 1 & Draft Revision 15:45 – 16:45 Commissioning & verification
ISO-DIS 14644-3:2016 • ISO TC209 new cleanroom standards and outreach
09:15 KEYNOTE SPEAKER projects II Da Qain Wang - CCCS
Dave Blank, University Twente Sheesh Gulati - Measuretest
• ISO TC209 new cleanroom standards and outreach
10:00 BREAK AT THE EXHIBITION • Invited speaker
projects III David Ensor
Koos Agricola and Conor Murray •
Cleanroom requirements
from 10:00 - 13:00
TUTORIAL 1:
t TUTORIAL 1
t TUTORIAL 2
10:30 Outdoor airborne contamination
in hospitals and cleanrooms 15:15 BREAK AT THE EXHIBITION
11:45 Contamination in laser optics
• Cleanroom airborne contamination in relation to outdoor • Research on precision cleaning technologies for large Introduction of VCCN guideline 8:
airborne contamination Michel Thibaudon aperture optics Xiao Dong Yuan - CAEP 15:45 in use monitoring of operating theatres LOUWMAN MUSEUM
• Development of the guideline for the classification and • The study of laser induced damage owing to surface • Introduction of VCCN guideline 8: On Monday 24 September ISCC’18 organizes a banquet dinner at
testing of air permeability of the cleanroom envelope and contamination for lager aperture optics in high power In use monitoring of operating theatres the Louwman Museum. As well as wonderful food, you will enjoy an
similar controlled environments laser facility Xin Xiang Miao - CAEP Roberto Traversari - TNO amazing location. You can add the banquet dinner to your personal
Harm van den Oever - Kuijpers
• Study of organic contamination removed by plasma • Introduction of VCCN guideline 8: programme via your registration.
• Ultra fine dust and health with controllable deposition cleaning technology for critical surface In use monitoring of operating theatres II
•
•
•
of Nano structured particles in clean rooms and other Hao Liu - CAEP Martin Janssen- Radboudumc
technologies Bob Ursem - TUD The Louwman Museum is home to the world’s oldest private collection
Requirements
Contamination control solutions
Cleanliness (air, surface and transfer) and standards
Risk assessment (Product, Process, FMEA, HACCP)
11:45 Design and construction Safety and standardisation challenges of motorcars, compiled by two generations of the Louwman family. The
15:45
10:30 How technical trends enhance selection • Cleanroom zoning, the challenge of pressure differential for life science facilities museum dates back to 1934 and now comprises over two hundred and
and performance monitoring of garments and flow Frans Saurwalt - Kropman • Preparing parenteral nutrition formulations: fifty antique and classic motorcars. Experts regard the collection as one
• New selection criteria of protective garments for • Clean and protective environment – CAPE hospital pharmacy compounding department
cleanrooms and controlled environments Mathieu Wasiak - CHU Clairmont-Ferrand of the most beautiful in the world. The museum exudes passion. Each
Udo Gommel - Fraunhofer IPA
Steve Marnach - DuPont car has its own story to tell, its own contribution to history. The motor
• Ventilation equations Keith Beattie, EECO2 life science Lead • Development and status of the CEN Biocontamination
• To reuse or not to reuse: a global study on the control project (European standard) car is a mirror of culture.
performance of cleanroom garments over their life cycle Michel Thibaudon
Matheus Rodrigues Barbosa - DuPont 13:00 LUNCH BREAK AT THE EXHIBITION • Requirements for detergents used in non sterile The collection is housed in a purpose-built museum in The Hague, the
• The digitalization of cleanrooms pharmaceutical applications city where P.W. Louwman established his Dodge and Chrysler import
14:00 Operating theatre contamination
Frans Saurwalt and Arnold Brunner
from 14:00 - 17:00
Establish Control
TUTORIAL 2:
Dennis Smeijer and Arthur Lettinga - Berendsen Thomas Altmann - Ecolab
• A comparison between measured values of airborne viable
company. The building, designed by American architect Michael Graves,
particles and calculated values with the dilution principle in 15:45 Contamination risk in blends in sympathetically with its historic surroundings. The landscape
10:30 Requirements for space and photonics +... semi conductor industry
operating rooms with low velocities gardens, designed by Lodewijk Baljon, complement the architecture of
• Biocontamination control in space industries: unidirectional air flow systems • New method for the assessment of condensed
a general overview Bengt Ljungqvist - Chalmers University contamination by chemicals onto surfaces (SCC)
the building.
Markus Keller and Udo Gommel - Fraunhofer IPA Vanessa Pfenning - Fraunhofer IPA
• Distribution of microbial contaminants in operating
• Contamination study of space sensitive surfaces theatres and healthcare environments • Think outside the box: film type contamination,
by packaging materials Delphine Faye - CNES Eugen Lichtmer - Technical University Berlin their impact and ways of detecting and avoiding
• Contamination control in operating theatres Marcel Kleßen - TREAMS
• From clean machine to…
Remko Noor
•
•
•
•
Philip van Beek - Contamination Q&A • Residual gas analysis as tool for material screening
for UHV applications and comparison to other
10:30 Food industry emission test methods
Operational procedures
Design and Construction
Cleanroom concepts
Program of Requirements
14:00 Practical approaches towards
• Contamination control and hygienic design developing life science facilities Markus Keller, Udo Gommel - Fraunhofer IPA
in the food industry
Frans Saurwalt - Kropman • Case study on hospital aseptic compounding facilities 14:00 Energy management
and radiopharmacies Conor Murray - 3-dimension
• Analysis of operation and energy consumption
• Guidelines central sterilization department of hospital’s isolation room Wim Zeiler - TUE
OR design from a different perspective Paul Joosten - Kuijpers
11:45 • Ventilation eff improvement Paul Molenaar - TUE
• Hospital project in Brasil Antonio Gamino - GPAX Consult • Digitizing the interpretation process
in environmental monitoring • Modern PTFE membrane based HEPA/ULPA filters
• Contamination control in displacement ventilated Jean-Paul Sanders - Microtechnix for improved energy savings and risk reduction
operating theaters Fransesco Romano - Polimi Marc Schmidt - AAF
14:00 Monitoring air and surface cleanliness
• Ozon cleaning in OR’s
Johannes K-M Knobloch
(technical applications) 17:00 KEYNOTE SPEAKER
• Environmental monitoring Jason Kelly - Lighthouse Bas Zaat, Amsterdam Medical Center
Time • Traceable calibrations Edwin den Hartog - Kalibra Time 17:45 DRINKS AT THE EXHIBITION
schedule schedule
Tutorial 1 • Fast particle cleanliness monitoring of high tech Tutorial 2
continues product surfaces Anton de Jong - TNO continues
19:00 BANQUET AT LOUWMAN MUSEUM
22 Contamination Control Magazine volume 3-2018 23TUESDAY 25 & WEDNESDAY 26 SEPT
1
TIME PROGRAMME TUESDAY 25 SEPTEMBER TIME PROGRAMME TUESDAY 25 SEPTEMBER WORKSHOPS TUESDAY TIME PROGRAMME WEDNESDAY 26 SEPTEMBER
Contamination control Bustour to ASML
08:00 REGISTRATION 11:00 in semiconductor industry
Tuesday 25 September 07:30-09:45
09:15 – 10:15 Implementation GMP annex 1
08:30 KEYNOTE SPEAKER • Vacuum spikes: effects and control of contamination 11:00 – 12:00 Particle deposition monitoring 09:45-12:00 ASML Experience Center
Vadim Banine, ASML on vacuum sealing surfaces 11:00 – 12:00 New guideline for CSD
Konstantinos Gkrekos - Thermo Fischer Scientific
09:15 Establishing contamination control 13:15 – 14:15 Development international
12:00-12:30 Bustour to Philips Innovation Center
for future proof hospitals • Design and testing of an noninvasive airborne moleculair con- guideline for hospital ventilation
tamination monitoring system for a front-opening unified-pod 13:15 – 14:15 Hygienic design Lunchbreak
• Industry innovation agenda on contamination control for sub 10nm semiconductor manufacturing process 12:30-13:30
Philip van Beek and Chris Delaney •
Cleanroom operations
from 09:15 - 12:15
TUTORIAL 3:
t TUTORIAL 3
in hospitals Roberto Traversari - TNO Bryan Puruncajas - National Taipei University of Technology
13:30-15:00 Philips Innovation Center
• Standard developments for operating theatres and • Cleanliness quantification of wafer metrology systems
2
isolation rooms in Europe Frans Saurwalt - Kropman John Timmermans - NTS
15:00-16:45 Bustour to The Hague
• The future proof OR isolation rooms in Europe General standards
Remko Noor
11:00
• ISO/DIS 14644-15: Assessment of suitability for use of
Biosafety risks and preventions equipment and material by airborne contamination by
09:15 chemicals (ACC) Markus Keller - Fraunhofer IPA Beelden aan Zee 07:30-09:45 Bustour to Philips Medical Care
• Analysis of cross-infection in a hospital’s On Wednesday 26 September ISCC'18 organizes
isolation room Ilse Schoenmakers - Arcadis • Comparison of the photometer and airborne
09:45-12:30 Philips Medical Care
particle counter methods for integrity testing of HEPA a closing dinner at Museum Beelden aan Zee.
• High containment BSL 3-4 Paul Joosten - Kuijpers and ULPA filters according to ISO 14644-3 The museum, hidden in the dunes, right behind 12:30-13:00 Bustour to Philips Museum
•
•
•
• Biosafety cabinet with air isolation system (AIS) Bernard Thaveau - Aerolab
the boulevard of Scheveningen is a unique venue.
for tissue engineering Naoki Ogawa - Airtech • Cleanliness behaviour of consumables; PWI Philips Museum
13:00-14:00
Procedures
Maintenance
Cleaning
Cleanroom behaviour
Udo Gommel - Fraunhofer IPA This privately founded museum is housed in one
09:15 Contamination risks and control solutions of the finest museum buildings in the Netherlands,
for electromechanical devices 12:15 LUNCH BREAK AT THE EXHIBITION 14:00-15:00 Lunchbreak
designed by the famous Dutch architect Wim
3
• Contamination control applied to inkjet printhead
Koos Agricola - Océ Technologies 13:15 Operations in space industry Quist. The museum was built using sand coloured 15:00-16:45 Bustour to The Hague
André van Tongeren and Robert Mielke •
Demonstrate control
from 12:45 - 15:45
TUTORIAL 4:
• Evaluation of decontamination process adapted materials, to blend with its seaside location.
• Creating, implementing and maintaining a monitoring
plan based on risk assesment to large optical components David Cheung - Entegris
HaŞim Solmaz - Ligthouse • Statistical illustration of cleaning method You will discover a special collection of sculptures Bustour to ESA/ESTEC
efficiencies for flight hardware surfaces 08:30-09:45
• Risks due to the use of cleanroom technology in the beautiful building. The museum is the only
components Joachim Ludwig - Colandis Thomas Jordan - Airbus ESA/ESTEC
museum in the Netherlands that specializes in 10:30-12:00
Contamination monitoring • Particulate contamination size distribution on optical modern and contemporary international sculpture.
09:15 systems evaluation
12:00-12:45 Bustour to Space Expo
• Development and use of thermally generated aerosol Sabine Dagras - Airbus Defence and Space The collection holds work by sculptors as diverse
for cleanroom airflow visualisation testing and HEPA as Armando, Stephan Balkenhol, Iris Le Rütte, Tony
filter challenging Trevor Dunnington - Concept Smoke 13:15 Effective control 12:45-13:45 Lunchbreak
pharmaceutical manufacturing Cragg, Per Kirkeby, Giacomo Manzú, Kiki Smith,
• ISO 14644-3 B7 installed filter leakage tests - Space Expo
a comparison and guidance Tim Triggs - ATI • Case studies of recurrent microbial contamination - Igor Mitoraj, Jan Meefout, Berlinde De Bruyckere, 13:45-16:00
•
•
•
benefit of EM data review and periodic audit Shinkichi Tajiri and Cornelis Zitman.
4
• Magnetic Field Interference – A Rising Consideration for of practices Walid El Azab - Steris 16:00-16:45 Bustour to The Hague
Applications
Monitoring
Verification
Measurement methods
Semiconductor Fab and Process Tool Design
Wolfgang Eißler - M+W • Microbiology single use impactor head
Frank Panofen - Particle Measuring Systems
10:30 BREAK AT THE EXHIBITION • Cleanliness assessment and cleaning validation 08:30-09:30 Bustour to HAL ALLERGY
of medical devices Udo Gommel - Fraunhofer IPA
11:00 Design and construction
10:00-11:00 HAL ALLERGY
• Offsite construction – the latest innovation in global clean 13:15 Particle deposition and surface cleanliness
room manufacturing Rowin Vos - Connect 2 Cleanrooms • CLEAPART-100 to monitor particle deposition rate Walk to Biotech Training Facility
in laser cleanrooms Isabelle Tovena Pecault - CEA 11:00-11:15
• Clean build protocol Andrew Watson - CBE Pty
• POD’s offsite vs site constructed flexible modular
• The PFO 1000 Monitor: A novel real-time, in-situ,
11:30-12:30 Biotech Training Facility
automated instrument for monitoring particulate
cleanroom approaches Conor Murray - 3-dimension fall-out in clean environments Andrew Holland - XCAM
12:30-13:15 Lunchbreak
11:00 Cleaning and desinfection • Particle deposition rate applications
Koos Agricola - Technology of Sense
• Cleaning and disinfection programs part of a lifecycle ap- 13:15-13:30 Bustour to Rijksmuseum Boerhave
proach: future Annex 1 requirements Walid El Azab - Steris
14:30 BREAK AT THE EXHIBITION 13:30-16:00 Rijksmuseum Boerhave
• Development of a harmonised method for cleanroom
hard surface disinfectant efficacy evaluations KEYNOTE SPEAKER
Rachel Blount - Ecolab Time 15:00 Peter Ros, Futurologist 16:00-16:45 Bustour to The Hague
schedule
• Management of non-viable particle excursions in the context of Tutorial 3
the new ISO14644-2 Olivier Chancel - Boehringer Ingeheim continues 15:45 CLOSING CEREMONY 17:30-21:30 CLOSING DINNER at Beelden aan Zee
24 Contamination Control Magazine volume 3-2018 25EXHIBITORS
ENTRANCE
x1
x2
x3
x6 x5 x7
| | | x4
| |
De enige leverancier T A
M A N A G E M
E
N
A
van totaaloplossingen D T
voor Contaminatie Contamination
A
AAF 40
E
Ecolab België 25
Optimus AG
P
60
Monitors AerSMASH x7 EHEDG 47 Pedak 45
Monitoring Alcochem
ATI
46
28
G
Guardtech Engeland
Philips
PMS
41
30
Audion Packaging Machines 12 I PP4CE F
Avidicare 11 IMI Aero-Dynamiek 33 Pro Cleanroom Valkensvaard 26
B Industrial HVAC Control Soluations 14 R
STERILITY Environmental BaseClear 44 Infuser / Novidis RevDesinfectieRobots 5
Services Monitoring Berendsen part of Elis A&B Initial Eindhoven Romex x5
ASSURANCE Systems
C
Camfill x6
ISCC’20 Turkey
K
x4 Royal HaskoningDHV
S
31
Catec 21 Kalibra 18 SAC Nederland 15
Voor meer informatie contacteer: Charles River 17 Kingspan 2 Staxs 24
pmeasuring.com Cleanroom Combination Group 42 & 43 Kropman Installatietechniek 38 Steris Belgium 37
Cleanzone x1 Kuijpers 39 T
T: +32 10 23 71 56 Climatech 29 L Tatasteel NL
E: pmsbenelux@pmeasuring.com Training and Connect 2 Cleanroom 1 Laser Vision 54 Technology of Sense 32
Education Contec Inc. Ltd. 34 Lighthouse 22 Texwipe 56
Copan 48 M V
D T Cotes 13 MANN + HUMMEL 19 VCCN 7
A N CSI 10 MBV AG 6 W
T E D N Weiss Technik 23
A M
M A N A G E Denios
Dupont
16
27
Nestinox
NORA flooring 36
Williamson - Dickie
X
20
Dutch Cleanroom Furniture 35 O Xcam Northhampton 8
26 Contamination Control Magazine volume 3-2018 27DEMONSTRATORS
PRINTED FLEXIBLE SILICONE ELECTRONICS ON PAPER
The new production process for printed flexible electronics makes it
possible to print high performance chemically stable crystalline silicon
on flexible, biocompatible or biodegradable substrates such as paper.
The new process uses a novel ‘silicon ink’ that uses UV light to cure,
instead of the traditional very high temperatures. Because crystalline
silicon can be used, there is no need for poor performing and often
toxic organic inks.
WHEN?
The process has been developed, optimised and patented. Basic circuit
components have been fabricated, confirming superior performance
and improved chemical stability. The next step is to develop a complete LAB-ON-A-CHIP A FULL-SCALE LABORATORY
NANOPARTICLES AT THE PUSH OF A BUTTON
sensor system. ON A MICROSCALE
Nanoscientsists spend the majority of their time on the synthesis of
Lab-on-a-chip technology makes it possible to conduct HIGH RELIABILITY SUNSENSORS FOR SPACE
nanoparticles. Besides, it is very hard to scale up production. VSParticle
Ryoichi Ishihara – Technical University Delft miniaturised lab analysis on micro- or nanoscale. The chips can AND TERRESTRIAL APPLICATIONS
eliminated both challenges by simplifying the production of nanoparticles.
vary in size from a few millimeters up to a few square centimeters. Lens R&D supplies high reliability Sunsensors for space applications
The VSParticle Generator One uses spark ablation to produce well
Lab-on-a-chips contain channel structures and have one or more small enough to be used on small satellites but good enough to be used
defined nanoparticles of 0-20 nm in diameter. By adjusting gas flow,
laboratory functions built within. The number of applications is still on big ones as well.
spark energy and spark frequency, the particle size and production rate
growing and lab-on-a-chip technology is now related to the fields
can be controlled.
of microfluidics, MEMS* and µTAS**. The BiSon64 and BiSon64-B Sunsensors are qualified to extreme
VSParticle offers a cost effective, on-demand, on-location way of levels of environmental loading and qualified over a temperature range
Application areas of lab-on-a-chip devices of -40°C to +80°C with planned flights on several satellites (ESAIL,
producing nanoparticles. It brings nanotechnology from the lab to
The time when lab-on-a-chip technology was only for analysis VESTA, Earth-I etc).
commercially available products in microelectronics, catalysis and
purposes, has long been over. It is no longer only a scientist’s
healthcare.
territory. Nowadays lab-on-a-chip technology is becoming part of The BiSon 64-ET and BiSon64-ET-B Sunsensors are under full ESA SCC
the common world. Especially the medical world, where point-of- qualification (within a GSTP program) over a temperature range of -125°
Aaike van Vugt – VSParticle
care testing gives us quick results and reduces the workload for to +125°C. Where a flight contract has been signed for the delivery to
doctors and analysts. the ESA Proba-3 mission, these sensors will be qualified for 15 years in
GEO orbit.
IN AIR MICROFLUIDICS, NO CHIP REQUIRED Erik Staijen – Micronit Microtechnologies
IamFluidics has invented in-air microfluidics (IAMF), which In preparation for the future Lens R&D is also working on albedo
enables the production of monodisperse microdroplets insensitive analogue Sunsensors based on SiC detector technology in
and -particles at industry-level production rates while frame of a Dutch high tech systems and materials program (HTSM) as
maintaining the resolution of microfluidics. IAMF is a well as a small digital Sunsensor for telecom applications in frame of an
novel chip-free technology that enables the production of ESA Artes program.
monodisperse micro-emulsions and micro-suspensions
at industry-level production rates while maintaining the Johan Leijtens – Lens Research & Development
resolution of conventional microfluidics.
PHOTONIC INTEGRATED CIRCUITS Menno Noorlander – IamFluidics
Photonics is the key enabling technology engine needed to keep the globe
communicating and connected. It provides the bandwidth, speed, reach and
flexibility needed to run new applications that everyone knows – healthcare &
life sciences, internet of things, M2M, social media, big data, data centers, cloud
computing and voice over IP. It’s an energy efficient technology with which to scale
up all these services.
LioniX International offers several solutions and services for assembly and
packaging of Photonic Integrated Circuits (PIC). These specifically apply to
prototypes, demonstration models and small-volume series of end products.
Arne Leinse – LioniX International
28 Contamination Control Magazine volume 3-2018 29WORKSHOPS TUTORIALS
Tutorial Programme
GOLD IN THE CLASSROOM:
PRODUCE IT IN YOUR OWN MICROFLUIDIC LAB ON A CHIP WORKSHOP PROGRAMME TUTORIAL PROGRAMME The tutorial programme will take place parallel with the conference
programme. When registering for the symposium you can select a
As well as the regular workshop programme, ISCC’18 also organizes The workshop programme will take place in parallel with the conference tutorial session instead of visiting the conference session. A tutorial will
a chip technology workshop. The hands-on workshop will teach you programme. The workshops will give the participant the opportunity MONDAY 24 SEPTEMBER take about 2,5 hours (two speakers plus short break).
some of the principles of labs on a chip by making and testing such to have an interactive session about a specific topic. All workshops
devices yourself, and learning how this is done in the classroom. will be given in English will be about actual topics in Contamination 10:00-13:00 Cleanroom Requirements
The tutorial will be led by an experienced workshop leader. The
Assembling and testing the devices requires a relatively small amount Control. Each workshop will be given by experts on the specific topic. A • Risk assessment
maximum number of participants for a tutorial is 25.
of time, and is practiced during the session. Simple chips can be workshop will take about one hour. When registering for the symposium (Product, Process, FMEA, HACCP)
produced using foil, a perforator and scissors. More complex chips can you can select a workshop session instead of visiting the conference • Cleanliness
The ISCC 2018 tutorial programme gives a complete overview of
be made using an electronic cutting machine. Laser cutting is used for session. The maximum number of workshop participants is 25. (air, surface and transfer) and standards
the present (international) approach to cleanroom technology. Eight
prefabrication of foil for rapid assembly of various chips. The selfmade • Contamination control solutions
MONDAY 24 SEPTEMBER internationally known tutors will educate the participants on four main
chip is used to produce nanogold particles: Gold in the classroom. • Requirements (application)
11:45 – 12:45 Cleaning* topics:
Apart from the regular registration, there is no need to register upfront by Cees van Duijn and Chris Delaney Establish Control
14:00 – 15:00 Impact of nanoelectronics
14:00-17:00 1. The use of risk assessment to determine the cleanroom
for visiting this workshop. • Program of requirements
by Eric Stuiver and Philip van Beek technology that is required to control contamination sensitive
• Cleanroom concepts
15:45 – 16:45 Commissioning & verification* products, processes and treatments by setting cleanliness
by Andre van Tongeren • Design and construction
requirements.
• Operational procedures
2. Design and construction of a cleanroom solution to establish the
TUESDAY 25 SEPTEMBER required contamination control.
09:15 – 10:15 Implementation GMP annex 1 3. Procedures to operate the contamination control solution in
by Gert Beuving and Vanessa Pieters TUESDAY 25 SEPTEMBER a cleanroom. Important operations are garment selection,
11:00 – 12:00 Particle deposition monitoring changing procedure, cleanroom entry and exit and cleaning
09:15-12:15 Cleanroom Operations
by Paul Joosten and Rene Vis program. Measurement methods for verification (validation) and
• Cleanroom behaviour
11:00 – 12:00 New guideline for CSD* monitoring to demonstrate control.
• Cleaning
by Koos Agricola 4. The content is based on the present ISO TC209 standards (ISO
• Maintenance
13:15 – 14:15 Development international guideline 14644 and ISO 14698) and the future vision on these standards.
• Procedures
for hospital ventilation
by Frans Saurwalt and Roberto Travesari For each block, handouts of presentations are available. For each
13:15 – 14:15 Hygienic design* 12:45-15:45 Demonstrate Control
participant of a tutorial block, there is a tutorial book by Koos Agricola
• Measurement methods
LAB ON A CHIP by Frans Saurwalt
• Verification
available.
* Each workshop participant should submit a question.
MONDAY 24 SEPT During the workshop participants will discuss the various questions. • Monitoring
If required a certificate of attendance can be issued.
10:30 – 12:30 h • Applications
14:00 – 15:45 h
TUESDAY 25 SEPT The tutors are:
09:15 – 1 1:00 h • Koos Agricola (VCCN, ICCCS, CTCB-I, TC209
WG 1,3,4,11,12,13,14, CEN
1 3 :15 – 15:00 h TC243 WG 5)
• Arnold Brunner (Switzerland, SwissCCS, ICCCS,
ISO TC209 WG 4,13)
• Philip van Beek (VCCN, CTCB-I)
• Chris Delaney (Ireland, ICS, CTCB-I, ICCCS, ISO
TC209 WG 12)
• Robert Mielke (USA, IEST, Secretary ISO
TC209)
• Conor Murray (Ireland, ICS, ISO TC209
WG1,3,4,13,14, CEN TC243 WG 5)
• Frans Saurwalt (VCCN, ICCCS, EHEDG, ISO
TC209 WG 3,4, CEN TC156
• André van Tongeren (VCCN, CTCB-I, ICCCS, ISO
TC209 WG 3,4)
30 Contamination Control Magazine volume 3-2018 31
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