Broadband terahertz wave generation from an epsilon-near-zero material
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Jia et al. Light: Science & Applications (2021)10:11 Official journal of the CIOMP 2047-7538 https://doi.org/10.1038/s41377-020-00452-y www.nature.com/lsa ARTICLE Open Access Broadband terahertz wave generation from an epsilon-near-zero material Wenhe Jia1, Meng Liu2, Yongchang Lu2, Xi Feng2, Qingwei Wang2, Xueqian Zhang2, Yibo Ni1, Futai Hu1, Mali Gong1, Xinlong Xu3, Yuanyuan Huang3, Weili Zhang 4, Yuanmu Yang1 and Jiaguang Han 2 Abstract Broadband light sources emitting in the terahertz spectral range are highly desired for applications such as noninvasive imaging and spectroscopy. Conventionally, THz pulses are generated by optical rectification in bulk nonlinear crystals with millimetre thickness, with the bandwidth limited by the phase-matching condition. Here we demonstrate broadband THz emission via surface optical rectification from a simple, commercially available 19 nm- thick indium tin oxide (ITO) thin film. We show an enhancement of the generated THz signal when the pump laser is tuned around the epsilon-near-zero (ENZ) region of ITO due to the pump laser field enhancement associated with the ENZ effect. The bandwidth of the THz signal generated from the ITO film can be over 3 THz, unrestricted by the phase- matching condition. This work offers a new possibility for broadband THz generation in a subwavelength thin film made of an ENZ material, with emerging physics not found in existing nonlinear crystals. 1234567890():,; 1234567890():,; 1234567890():,; 1234567890():,; Introduction GaP16, and LiNbO317, with a femtosecond laser typically Terahertz (THz) radiation spanning from 0.1 to 10 THz operating in the near-infrared range. However, the falls between the microwave and infrared spectral ranges1. intensity and bandwidth of the generated THz signal, as In recent years, THz technology applications have been well as the pump wavelength, are often limited by the rapidly expanding2,3 in areas including nondestructive phase-matching condition in the bulk nonlinear crystal. material evaluation4,5, imaging6,7, sensing8,9, and wireless This problem has recently stimulated growing interest in communication10,11. THz radiation can be generated developing ultrathin THz emitters with thicknesses down through the nonlinear downconversion of optical signals to even a few atomic layers. In particular, optical meta- or through the nonlinear upconversion of microwave materials composed of split-ring resonators with magnetic signals, among which the nonlinear optical rectification dipole resonances have been identified as excellent non- method is particularly popular for the generation of linear THz sources, with a spectral bandwidth unrest- broadband THz pulses for spectroscopy-related applica- ricted by the phase-matching condition, as well as the tions. Despite the recent discoveries of broadband THz material absorption in the Reststrahlen region of con- generation in air plasma12,13 and liquids14, THz emission ventional nonlinear crystals18,19. However, the highly is more routinely generated by pumping solid-state non- sophisticated nanofabrication process and the low laser centrosymmetric nonlinear crystals, such as ZnTe15, damage threshold have largely hindered their wide adoption. Nanoscale THz emitters have also been realized with monolayer graphene20 and tungsten disulfide21, Correspondence: Yuanmu Yang (ymyang@tsinghua.edu.cn) or although with limited efficiency. Furthermore, surface Jiaguang Han (jiaghan@tju.edu.cn) 1 State Key Laboratory of Precision Measurement Technology and Instruments, THz emission from semiconductors such as InAs, InSb, Department of Precision Instrument, Tsinghua University, Beijing 100084, China 2 and GaAs has been investigated22,23, although efficient Center for THz Waves and College of Precision Instrument and THz emission has only been shown in the reflection Optoelectronics Engineering, Tianjin University, Tianjin 300072, China Full list of author information is available at the end of the article configuration. These authors contributed equally: Wenhe Jia, Meng Liu © The Author(s) 2021 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
Jia et al. Light: Science & Applications (2021)10:11 Page 2 of 8 More recently, materials that exhibit a vanishing real frequency of ITO further follows the formula pffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffi part of their permittivity in certain spectral ranges24,25, ωp ¼ Ne e2 =meff ε0 , where Ne is the carrier density, ε0 is commonly known as epsilon-near-zero (ENZ) materials, the permittivity in vacuum, and meff is the ensemble- have drawn much attention in the field of nonlinear averaged effective electron mass. The carrier density of ITO optics26–29 for applications such as second- and third- is typically in the range of 1020–1021 cm−3, leading to an harmonic generation30–32, all-optical switching33,34, and ENZ wavelength λENZ typically in the near-infrared region. tuneable absorption35. The enhancement of nonlinear optical responses in materials within a subwavelength In this work, we show THz generation from commer- thickness, induced by the ENZ effect, can be partially cially available ITO glass by leveraging the ENZ effect. We explained by the amplification of the pump laser field due observe THz emission from a 19 nm-thick ITO film when to the continuity of the normal displacement field at the pumped around its ENZ wavelength. The bandwidth of boundary of the ENZ material and the background med- the generated THz pulse is ~3 THz, limited only by the ium, following the formula εENZ·EENZ = ε0·E0, where εENZ bandwidth of the pump laser and the detection crystal. and ε0 are the permittivities of the ENZ material and We measure the pump wavelength, power, and polariza- background medium, respectively, and EENZ and E0 are the tion dependence to confirm that the THz emission ori- normal components of the electric fields at the material ginates from surface optical rectification in the ITO film boundary. When εENZ approaches zero, the electric field in and is enhanced by the ENZ effect. Moreover, we observe the ENZ material can be significantly enhanced. The that the most efficient THz generation initially occurs at a enhanced nonlinearity in the ENZ material can be alter- pump wavelength slightly blueshifted from the static bulk natively explained by the small group velocity, also known λENZ of ITO, which redshifts as the pump fluence as the slow-light effect36, in the Ferrell–Berreman mode or increases, which may be associated with the nonlocal the ENZ mode supported in the ENZ thin film. effect as well as the unique hot-electron dynamics in the ENZ effects occur in a wide range of materials, ITO film. including transparent conducting oxides (TCOs)27, doped semiconductors37, and polar dielectrics38. Indium Results tin oxide (ITO) is one of the most widely available ENZ Sample characteristics and measurement setup materials. It has been used as transparent electrodes in A schematic of the commercially available ITO on a solar cells and consumer electronics. The dispersion of glass substrate (PGO GmbH) is depicted in Fig. 1a. The the permittivity of ITO follows the Drude–Lorentz film is found to be amorphous from the X-ray diffraction formula ε¼ε1 þω2p;b = ω20;b ω2 iγ b ω ω2p =ωðω þ iγ f Þ, measurement, with a root mean square roughness of 0.35 nm determined from the atomic force microscopy where ε∞ is the high-frequency permittivity, ωp,b, ω0,b, measurement (see Supplementary Fig. 1 and Supple- and γb are the plasma frequency, resonance frequency, mentary Note 1 for details). The real and imaginary parts and plasma damping rate of bound electrons, respec- of the relative permittivity and the thickness of the ITO tively, and ωp and γf are the plasma frequency and plasma film are measured through spectroscopic ellipsometry, as damping rate of free electrons, respectively39. The plasma shown in Fig. 1b (see Supplementary Note 2 for details). a b λENZ= 1400 nm c Pump pulse THz pulse 8 2 Real (ε) Z Imag (ε) 0.3 Y 6 1 (Ez,ITO/Ez,incident)2 X Permittivity 0.2 4 Rp/Rs 0 19 nm 2 –1 0.1 –2 0 ITO 1000 1100 1200 1300 1400 1500 1600 1700 1000 1100 1200 1300 1400 1500 1600 1700 Glass substrate Wavelength (nm) Wavelength (nm) Fig. 1 Static optical response of the ITO film. a Schematic of the ENZ sample composed of a 19-nm-thick ITO layer and a 1.1 mm-thick glass substrate. b Real and imaginary parts of the permittivity of the ITO film as a function of wavelength measured via spectroscopic ellipsometry. The ENZ wavelength is marked with a grey dashed line. c Rp/Rs and (Ez,ITO/E0,incident)2 measured (dashed line) and calculated by the transfer matrix method (solid lines) as a function of the wavelength with an incident angle of 40°, where Rp and Rs are the reflectance of p-polarized and s-polarized light, respectively, and Ez,ITO and Ez,incident are the normal components of the electric field in the ITO film and the incident electric field, respectively
Jia et al. Light: Science & Applications (2021)10:11 Page 3 of 8 The real part of its permittivity crosses zero at a wave- wavelength tuneable from 1100 to 1600 nm in both the length of 1400 nm, with an imaginary part of 0.35. The p- transmission and reflection configurations (see ‘Materials polarized linear reflectance spectrum of the sample is and Methods’ for details). Figure 2b, c illustrate the measured at an incident angle of 40°, showing a resonance measured THz time-domain signals. We observe THz dip near its λENZ as a result of the excitation of the emission from the ITO sample in both the transmission Ferrell–Berreman mode25,40, in close agreement with the and reflection configurations. In contrast, no THz emis- calculation, as illustrated in Fig. 1c. The corresponding sion is observed from a bare glass substrate under iden- electric field enhancement in ITO near its λENZ is also tical optical excitation conditions. We attribute the origin calculated using the transfer matrix method. of the THz generation from the ultrathin ITO film to the The key elements of the THz time-domain emission surface second-order optical nonlinearity. Similar obser- spectroscopy system in both the transmission and vations on the surface second-order optical nonlinearity reflection configurations are schematically shown in of ITO have been made in previous literature studying the Fig. 2a. We use the output of an optical parametric second-harmonic generation of ITO films around their amplifier (OPA) to excite the ITO sample with a ENZ wavelength39,41,42. a Ti:sapphire amplifier Time delay Balanced Parabolic mirror photodiodes QWP Probe 800 nm 35 fs 1 kHz Splitter ZnTe Wollaston Lens crystal prism Pump Mirror OPA 1100 nm–1600 nm 100 fs 1 kHz Sample b c 0.8 0.8 Transmission ITO film 0.6 Reflection ITO film Glass Glass 0.6 THz amplitude (norm.) THz amplitude (norm.) 0.4 0.4 0.2 0.2 0.0 0.0 –0.2 –0.2 –0.4 –0.4 –2 –1 0 1 2 3 4 –2 –1 0 1 2 3 4 Time delay (ps) Time delay (ps) Fig. 2 Experimental setup and time-domain THz signals from the ITO film. a Schematics of the THz generation and detection setup in both the transmission and reflection configurations. b, c Time-domain THz signal measured by pumping the ITO film (red) and 0.5 mm-thick bare glass substrate (blue) with pump wavelengths of 1350 and 1400 nm in the transmission and reflection configurations, respectively
Jia et al. Light: Science & Applications (2021)10:11 Page 4 of 8 Pump wavelength dependence of the THz generation conduction band electrons in ITO quickly thermalize into To further confirm that the THz emission from ITO is a hot Fermi distribution with a maximum electron tem- enhanced by the ENZ effect, we measure the pump perature Te. Electrons then cool down and relax back to wavelength dependence of the THz generation. In Fig. 3a, the conduction band minimum through energy exchange we plot the peak-to-peak amplitude of the THz signal as a with phonons33,34. The meff of ITO is a function of the function of the pump wavelength, with pump fluences of electron distribution and Te and is therefore time 0.78, 3.12, and 6.25 mJ/cm2 in the transmission config- dependent, owing to the nonparabolicity of the conduc- uration. A redshift of the THz generation peak from 1340 tion band. According to the Drude–Lorentz formula, an to 1400 nm is observed as the pump fluence increases. increase in meff leads to a decrease in ωp and a redshift in At the low pump fluence, the THz generation peak is the ITO’s λENZ. The subpicosecond electron dynamics are blueshifted from the static λENZ of the bulk ITO film comparable to the dwell time of the pump pulse inside the measured through spectroscopic ellipsometry. This may ITO cavity, which leads to the pump pulse interacting be attributed to the nonlocal effect occurring in the with a time-variant ITO cavity44. As a result, we observe ultrathin ITO film, as the electron doping concentration the spectral redshift of the THz generation peak from the at the surface of the ITO film, where the THz wave is static λENZ of ITO. We develop a quantitative model generated, may be higher than that in the bulk ITO based on the hot-electron dynamics of ITO to derive a film39,43. However, as the pump fluence increases, due to static λENZ of 1286 nm at the surface of the ITO film, the photoinduced heating of conduction band electrons which redshifts to 1340 nm under a pump fluence of and the consequent time-dependent λENZ of ITO, the 0.78 mJ/cm2. Moreover, we calculate λENZ as a function of THz generation peak redshifts. As schematically shown in the pump fluence (see Supplementary Note 3 for details), Fig. 3b, upon sub-bandgap photoexcitation, the which explains the larger redshift when the ITO film is a λENZ b 1.0 THz amplitude (norm.) Pump (0.9 eV) 0.8 Static 0.6 Relaxation 0.4 Photoexcited 0.78 mJ/cm2 0.2 3.12 mJ/cm2 6.25 mJ/cm2 0.0 Static 1200 1300 1400 1500 1600 Pump wavelength (nm) c d 1600 104 104 1550 THz amplitude (a.u.) THz amplitude (a.u.) 1500 103 103 λENZ (nm) 1450 102 1400 1350 102 101 ITO film 1300 ZnTe crystal Calculation 10 0 1250 101 0.1 1 10 0.1 1 10 Pump fluence (mJ/cm2) Pump fluence (mJ/cm2) Fig. 3 Pump wavelength and pump fluence dependence of THz generation. a Measured peak-to-peak THz amplitude as a function of the pump wavelength with pump fluences of 0.78 (red), 3.12 (blue), and 6.25 mJ/cm2 (yellow) in the transmission configuration. The dashed curve denotes the static ENZ wavelength of the bulk ITO film measured via spectroscopic ellipsometry. b Schematics of ultrafast electron dynamics in the ITO film, which consist of photoexcitation, hot-electron redistribution, and relaxation. The dashed line represents the parabolic conduction band approximation. c Measured peak-to-peak THz amplitude as a function of the pump fluence in the transmission configuration with a pump wavelength of 1350 nm for the ITO film (red) and 1 mm-thick ZnTe crystal (blue). The dashed lines are from the linear fitting. d Calculated λENZ of the ITO film (red) and THz amplitude (blue) as a function of the pump fluence in the transmission configuration
Jia et al. Light: Science & Applications (2021)10:11 Page 5 of 8 excited with a higher pump fluence and is in good crystal we use quickly declines beyond 3 THz47. To verify agreement with the literature studying the ultrafast that this is indeed an issue, we change the ZnTe crystal dynamics of ENZ materials34,44. with a 1 mm thickness to another ZnTe crystal with a 0.1 mm thickness and observe an increase in the mea- Pump fluence dependence of the THz generation sured spectral bandwidth from 2.8 to 3.05 THz. To investigate the underlying physical mechanism of the THz generation in the ITO film, we also measure the Pump polarization and sample orientation dependence of peak-to-peak THz amplitude as a function of the pump the THz generation fluence, as shown in Fig. 3c. Under low pump fluence, the We further measure the peak-to-peak amplitude of THz THz amplitude scales linearly with the pump fluence, in signals versus the pump pulse polarization angle θ, as agreement with the linear scaling law of the second-order shown schematically in Fig. 4b. We define θ to be 0° and nonlinear process of optical rectification. When the pump 90° when the pump light is s-polarized and p-polarized, fluence exceeds 1.8 mJ/cm2, the THz amplitude deviates respectively. As shown in Fig. 4c, the p-component of the from the linear scaling, which we again attribute to the THz amplitude well fits the sin2(θ) function, consistent time-dependent λENZ of ITO. with the fact that the Ferrell–Berreman mode in ITO can For optical rectification, the nonlinear THz polarization only be excited with p-polarized light. Moreover, the s- ðTHzÞ is PTHz ¼ χ eff E02 , where E0 is the incident electric field component of the THz amplitude is
Jia et al. Light: Science & Applications (2021)10:11 Page 6 of 8 p-component THz a b X c 0° Fitting Z 100 s-pol 100 330° 30° ITO sample Y 80 Transmission Epump Pump pulse THz amplitude (a.u.) 10 60 300° 60° 40 1 20 p-pol 0 270° 90° 0.1 20 Detector: 40 0.01 0.1-mm-thick 120° 60 240° ZnTe crystal THz pulse s-comp 80 100 100 210° 150° 180° THz amplitude (a.u.) Transmission p-comp Relative polarization angle θ 10 1 0.1 d s-component THz e Detector: 0° 0° 0.01 1-mm-thick 8 330° 30° 330° 30° ZnTe crystal 6 THz amplitude (a.u.) THz amplitude (a.u.) 300° 60° 300° 100 Reflection 4 60° 10 2 0 270° 90° 270° 90° 1 2 0.1 4 120° 240° 120° 240° 0.01 Detector: 6 0.1-mm-thick 150° 210° 150° ZnTe crystal 8 210° 180° 180° 0 1 2 3 4 5 6 7 8 Relative polarization angle Azimuth angle of ITO Frequency (THz) Fig. 4 Spectral bandwidth and polarization dependence of the THz generation. a THz spectra (red) and noise spectra (grey) generated from the ITO film in both the transmission and reflection configurations, with 0.1 and 1 mm-thick ZnTe crystals serving as the detector. b Schematic illustration of the pump light, ITO film, and THz emission. θ and φ represent the polarization angle and azimuthal angle of the ITO film, respectively. c, d Polar graphs of the p-component and s-component THz amplitude as a function of the polarization angle θ in the transmission configuration. The p- component THz amplitude well fits the sin2(θ) function, indicated by the dashed lines. e Azimuthal angle φ dependence of the THz generation in the transmission configuration larger field enhancement44, and by coupling the ENZ in the transmission configuration and 45° in the reflection material to optical metasurfaces48. Moreover, although the configuration. We have calculated the electric field ITO film is currently pumped by a solid-state OPA, the enhancement factor as a function of wavelength and λENZ of ITO can be tailored by controlling the doping incident angle (see Supplementary Notes 5 and 6 for concentration during film deposition and postdeposition details). There is no significant difference in the field annealing30,49. For example, an ITO film with a λENZ near enhancement factor at 40° and 45° incidence angles. We 1550 nm can be directly pumped by a more compact fibre- did not use the larger incident angle due to the finite size based femtosecond laser with a lower system cost. of the ITO sample (1 cm2) and the space limitations for sample mounting in our current experimental setup. The Materials and methods sample is placed at the focus of a parabolic mirror, and the Optical measurement generated THz wave is focused on a < 110 > cut ZnTe In the experiment, we use a Ti:sapphire amplifier system crystal by another parabolic mirror. The other portion of with a central wavelength of 800 nm, a pulse duration of the laser beam from the amplifier system serves as the 35 fs, and a repetition rate of 1 kHz as the pump source. probe beam to implement electro-optical sampling of the The laser beam is divided into two beams by a beam THz signal through the use of the ZnTe crystal, a quarter- splitter to generate and detect the THz signal. The main wave plate (QWP), a Wollaston prism, and a pair of portion of the laser beam is used to pump an OPA to balanced photodiodes. It is noteworthy that the ZnTe produce infrared pulses with a pulse duration of crystal has the highest detection efficiency for the p- approximately 100 fs and a wavelength tuneable from 1100 polarized THz signal. We can obtain the THz waveform by to 1600 nm. The infrared pulse can be configured to excite changing the time delay between the generated THz beam the sample in either the transmission or reflection geo- and the infrared probe beam. The polarization state of the metry. The incident angle of the pump beam is fixed at 40° pump beam is changed by rotating a half-wave plate and a
Jia et al. Light: Science & Applications (2021)10:11 Page 7 of 8 polarizer. In the measurement, the time step is set to be 3. Ferguson, B. & Zhang, X. C. Materials for terahertz science and technology. Nat.
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